Determination method and substrate processing apparatus
AssigneeTokyo Electron Limited
InventorsHirokazu UEDA, Masafumi ASANO, Takanobu KAITSUKA, Yuji OTSUKI, Yasutoshi UMEHARA
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Abstract
There is provided a determination method comprising: a post-embedding measurement step for performing spectroscopic measurement on a substrate in which a pattern including a recess is formed, the recess having an embedding material embedded therein, and measuring an absorbance spectrum of the substrate having the embedding material embedded therein; and a determination step for determining an embedded state of the recess based on an integrated value of an intensity of the measured absorbance spectrum of the substrate at a plurality of wavenumbers.
Claims20
A determination method comprising:
- a post-embedding measurement step for performing spectroscopic measurement on a substrate in which a pattern including a recess is formed, the recess having an embedding material embedded therein, and measuring an absorbance spectrum of the substrate having the embedding material embedded therein;
- and
- a determination step for determining an embedded state of the recess based on an integrated value of an intensity of the measured absorbance spectrum of the substrate at a plurality of wavenumbers.
A substrate processing apparatus comprising:
- a light source configured to emit light to a substrate in which a pattern including a recess is formed and an embedding material is embedded in the recess;
- a light receiving mechanism configured to receive transmitted light emitted from the light source and transmitted through the substrate or reflected light emitted from the light source and reflected by the substrate;
- and
- a controller,
- wherein the controller executes:
- measuring an absorbance spectrum of the substrate in which the embedding material is embedded from the reflected light or the transmitted light received by the light receiving mechanism;
- and
- determining an embedded state of the recess based on an integrated value of an intensity at a plurality of wavenumbers of the measured absorbance spectrum of the substrate.
Dependencies are inferred from the claim text.