Dielectric film-forming composition
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorBinod B. De
Life of this patent
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Abstract
This disclosure relates to a dielectric film-forming composition that includes (a) at least one resin selected from the group consisting of: i) a fully imidized polyimide polymer; ii) a polyamic acid ester; iii) a cyclized polydiene resin; and iv) a mixture of a cyclized polydiene resin and a cyanate ester compound; and (b) at least one additive selected from a group consisting of: i) a polybenzoxazole (PBO) precursor; ii) PBO particles; iii) a mixture of PBO and silica particles; and iv) a PBO resin containing at least two reactive functional groups.
Claims15
A dielectric film-forming composition, comprising:
- a) at least one resin selected from the group consisting of:
- i) a fully imidized polyimide polymer;
- ii) a polyamic acid ester;
- iii) a cyclized polydiene resin;
- and
- iv) a mixture of a cyclized polydiene resin and a cyanate ester compound;
- and
- b) at least one additive selected from a group consisting of:
- i) a polybenzoxazole (PBO) precursor;
- ii) PBO particles;
- iii) a mixture of PBO and silica particles;
- and
- iv) a PBO resin containing at least two reactive functional groups.
A dielectric film, comprising:
- (a) at least one resin selected from the group consisting of:
- i) a fully imidized polyimide polymer;
- ii) a polyamic acid ester;
- iii) a cyclized polydiene resin;
- and
- iv) a mixture of a cyclized polydiene resin and a cyanate ester compound;
- and
- b) at least one additive selected from a group consisting of:
- i) a polybenzoxazole (PBO) precursor;
- ii) PBO particles;
- iii) a mixture of PBO and silica particles;
- and
- iv) a PBO resin containing at least two reactive functional groups.
Dependencies are inferred from the claim text.