Atomization device
AssigneePanasonic Intellectual Property Management Co., Ltd.
InventorsDAISUKE TABATA, SHOGO FUJIMOTO, TORU OKAZAKI, NAOFUMI HINO
Life of this patent
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Abstract
Gas-liquid ejector (50) includes atomization space (51) in which flow path (31) downstream of liquid flow path (21) is connected to a central part of an end surface of atomization space (51) on an upstream side, flow path (40) downstream of gas flow path (22) is connected to a circumference around the central part of the end surface of atomization space (51) on the upstream side, and flow path (40) downstream of gas flow path (22) has central axis (42) inclined from central axis (11) of flow path (31) downstream of liquid flow path (21).
Claims3
An atomization device comprising:
- a liquid flow path that supplies liquid;
- a gas flow path that supplies gas;
- and
- an atomization space in a cylindrical shape,
- the atomization space including:
- an upstream side to which a flow path downstream of the liquid flow path and a flow path downstream of the gas flow path are connected;
- and
- a downstream side from which droplets atomized by mixing the liquid and the gas in the atomization space are sprayed,
- wherein
- the flow path downstream of the liquid flow path is connected to a central part of an end surface of the atomization space on the upstream side,
- the flow path downstream of the gas flow path is connected to a circumference around the central part of the end surface of the atomization space on the upstream side, and
- the flow path downstream of the gas flow path has a central axis inclined from a central axis of the flow path downstream of the liquid flow path.
Dependencies are inferred from the claim text.