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US 2025/0062142 A1Published application
Substrate heat treatment apparatus cotrolling individually the output of the vcsel module
AssigneeViatron Co., Ltd.
InventorsHyoung June Kim, Byung Kuk Kim, Wang Jun Park, Tae Hyeong Kim
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Abstract
This present disclosure discloses a substrate heat-treating apparatus including a process chamber in which a flat substrate to be heat-treated is placed and a beam irradiating module having a plurality of VCSEL devices configured to irradiate a laser beam to the flat substrate, and the beam irradiation module is configured such that a supply current is controlled to allow outputs of the VCSEL devices to become the same.
Claims9
A substrate heat-treating apparatus, comprising:
- a process chamber in which a flat substrate to be heat-treated is placed;
- and
- a beam irradiating module comprising a plurality of vertical cavity surface emitting laser (VCSEL) devices, and configured to irradiate a laser beam to the flat substrate,
- wherein the beam irradiating module is configured such that a supply current is controlled to allow outputs of the VCSEL devices to become the same.
1 more element
Dependencies are inferred from the claim text.