Heated pedestal with low impedance rf rod

A substrate support for a process chamber, comprising:

• a pedestal having a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein;
• a hollow shaft coupled to a lower surface of the pedestal;
• and
• an RF rod extending through the hollow shaft and having an upper end coupled to the RF electrode, wherein an RF transmission path of the RF rod comprising a total length of all edges disposed along the upper end is greater than a total length of a perimeter of the upper end of the RF rod;
• and wherein the upper end of the RF rod has at least one of (a) a cross sectional width that is wider than a lower portion of the RF rod or (b) one or more slots.

A process chamber, comprising:

• a chamber body defining an interior volume therein;
• a substrate support disposed in the interior volume and including a pedestal having:
• a support surface for supporting a substrate, one or more heating elements disposed therein, and an RF electrode disposed therein;
• a hollow shaft coupled to a lower surface of the pedestal;
• and
• an RF rod extending through the hollow shaft and having an upper portion that includes an upper end coupled to the RF electrode, wherein the upper end of the RF rod has at least one of (a) a cross sectional width that is wider than a lower portion of the RF rod or (b) one or more slots.