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AssigneeASML Netherlands B.V.
InventorsDzmitry LABETSKI, Emericus Antoon Theodorus VAN DEN AKKER, Joost DE HOOGH, Zhuangxiong HUANG, Sjoerd Frans DE VRIES, Syed Aaquib HAZARI
Estimating the term…
A system for use in a lithographic, the system includes: a substrate table; another device; and at least one deformable partition. The substrate table (for example a wafer stage) is arranged to support a substrate. The system is configurable in a first configuration such that a surface of the device faces and is adjacent to the substrate and the substrate table. The at least one deformable partition either: (a) extends partially from the substrate table towards the surface of the device when the system is in the first configuration; or (b) extends partially from the surface of the device that faces and is adjacent to the substrate and the substrate table when the system is in the first configuration towards the substrate table.
A system for a lithography apparatus, the system comprising:
A substrate table arranged to support a substrate, the substrate table comprising:
A substrate table arranged to support a substrate, the substrate table comprising at least one deformable partition extending from the substrate table and having at least a component of extent in a direction perpendicular to a plane of a substrate when supported by the substrate table.
Dependencies are inferred from the claim text.