Measurement Device for Process Metrology
AssigneeBerthold Technologies GmbH & Co. KG
InventorsSteffen MUELLER, Joerg BAEUERLE, Tobias DAIBENZEIHER
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Abstract
A measurement device for process metrology, includes: a number n of sensors, wherein a respective sensor of the number n of sensors is designed to generate associated sensor data such that a total number n of sensor data is generated by way of the number n of sensors; a learning unit, wherein the learning unit is designed to calculate values of a number d of parameters of a hypothesis function based on training data; and a measurement device diagnostic unit, which is designed to calculate a number m of diagnostic values in dependence on the number n of sensor data based on the hypothesis function and the calculated values of the number d of parameters of the hypothesis function.
Claims4
A measurement device for process metrology, comprising:
- a number n of sensors (2_1 to 2_n), wherein a respective sensor (2_i) of the number n of sensors (2_1 to 2_n) is designed to generate associated sensor data (xi) such that a total number n of sensor data (x1, . . . , xn) is generated via the number n of sensors (2_1 to 2_n);
- a learning unit, wherein the learning unit is configured to calculate values of a number d of parameters (θ1, . . . , θd) of a hypothesis function (hθ) based on training data ((xt1(i), . . . , xtn(i));
- (ŷs1(i), . . . , ŷsm(i));
- and
- a measurement device diagnostic unit, which is configured to calculate a number m of diagnostic values (ŷ1, . . . , ŷm) in dependence on the number n of sensor data (x1, . . . , xn) based on the hypothesis function (hθ) and the calculated values of the number d of parameters (θ1, . . . , θd) of the hypothesis function (hθ).
Dependencies are inferred from the claim text.