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US 2025/0060331 A1Published application
Methods of fabricating nanoscale structures usable in molecular sensors and other devices
AssigneeRoswell Biotechnologies, Inc.
InventorsSungho Jin, Barry Merriman, Tim Geiser, Paul W. Mola
Life of this patent
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Abstract
A structure usable in a molecular sensor device comprises a substrate defining a substrate plane and spaced apart pairs of reducible metal oxide or metal nitride sheets attached to the substrate at an angle to the substrate plane. The structure further includes intervening dielectric sheets. Fabrication methods for manufacturing structures for molecular sensors are disclosed comprising oblique angle deposition of reducible metal oxide or metal nitride and dielectric layers, planarization of the resulting stack, and reduction of portions of the reducible metal oxide or metal nitride sheets to the corresponding base metal.
Claims20
A method of manufacturing a structure usable in a molecular sensor device, the method comprising:
- providing a substrate defining a substrate plane with a protrusion protruding from the substrate at an angle to the substrate plane;
- depositing a first reducible metal oxide or metal nitride layer in an orientation along a side of the protrusion to form a first reducible metal oxide or metal nitride sheet at the angle to the substrate plane;
- depositing an inner dielectric layer on the first reducible metal oxide or metal nitride layer to form an inner dielectric sheet at the angle to the substrate plane;
- depositing a second reducible metal oxide or metal nitride layer on the inner dielectric layer to form a second reducible metal oxide or metal nitride sheet at the angle to the substrate plane, wherein the first reducible metal oxide or metal nitride sheet and the second reducible metal oxide or metal nitride sheet form a pair of sheets spaced apart by the inner dielectric sheet between the first reducible metal oxide or metal nitride sheet and the second reducible metal oxide or metal nitride sheet;
- depositing an outer dielectric layer on the second reducible metal oxide or metal nitride layer to form an outer dielectric sheet at an angle to the substrate plane;
- repeating the depositing of the first reducible metal oxide or metal nitride layer, the inner dielectric layer, the second reducible metal oxide or metal nitride layer, and the outer dielectric layer at least once to form spaced apart pairs of reducible metal oxide or metal nitride sheets with an inner dielectric sheet between each reducible metal oxide or metal nitride sheet in the pair of reducible metal oxide or metal nitride sheets and an outer dielectric sheet between each pair of reducible metal oxide or metal nitride sheets;
- planarizing the pairs of reducible metal oxide or metal nitride sheets, the inner dielectric sheets, and the outer dielectric sheets to form exposed end portions of each, and
- reducing the exposed end portions of the reducible metal oxide or metal nitride sheets to the corresponding metal to form parallel metal electrode strips.
5 more elements
A method of manufacturing a structure usable in a molecular sensor device, the method comprising:
- providing a substrate defining a substrate plane with a protrusion protruding from the substrate at an angle to the substrate plane;
- depositing a first reducible metal oxide or metal nitride layer in an orientation along a side of the protrusion to form a first reducible metal oxide or metal nitride sheet at the angle to the substrate plane;
- depositing an inner dielectric layer on the first reducible metal oxide or metal nitride layer to form an inner dielectric sheet at the angle to the substrate plane;
- depositing a second reducible metal oxide or metal nitride layer on the inner dielectric layer to form a second reducible metal oxide or metal nitride sheet at the angle to the substrate plane, wherein the first reducible metal oxide or metal nitride sheet and the second reducible metal oxide or metal nitride sheet form a pair of sheets spaced apart by the inner dielectric sheet between the first reducible metal oxide or metal nitride sheet and the second reducible metal oxide or metal nitride sheet;
- depositing an outer dielectric layer on the second reducible metal oxide or metal nitride layer to form an outer dielectric sheet at an angle to the substrate plane;
- repeating the depositing of the first reducible metal oxide or metal nitride layer, the inner dielectric layer, the second reducible metal oxide or metal nitride layer, and the outer dielectric layer at least once to form spaced apart pairs of reducible metal oxide or metal nitride sheets with an inner dielectric sheet between each reducible metal oxide or metal nitride sheet in the pair of reducible metal oxide or metal nitride sheets and an outer dielectric sheet between each pair of reducible metal oxide or metal nitride sheets;
- planarizing the pairs of reducible metal oxide or metal nitride sheets, the inner dielectric sheets, and the outer dielectric sheets to form exposed end portions of each;
- selectively etching an exposed end portion of each inner dielectric sheet to form grooves in each inner dielectric sheet descending from the planarized edge toward the substrate;
- filling the grooves with PMMA-type resist material;
- depositing a metal layer on the planarized surface of the structure;
- and
- removing the PMMA-type resist material along with deposited metal residing thereon leaving an arrangement of pairs of spaced apart parallel metal electrode strips with the metal electrode strips in a pair of strips separated by a groove.
9 more elements
A structure usable in a molecular sensor device, said structure comprising:
- a substrate defining a substrate plane;
- spaced apart pairs of reducible metal oxide or metal nitride layer sheets attached on an edge of the reducible metal oxide or metal nitride layer sheet to the substrate at an angle to the substrate plane;
- an inner dielectric sheet disposed between the reducible metal oxide or metal nitride layer sheets in each pair of reducible metal oxide or metal nitride layer sheets;
- and
- an outer dielectric sheet disposed between spaced apart pairs of reducible metal oxide or metal nitride layer sheets,
- wherein an edge of each reducible metal oxide or metal nitride layer sheet, inner dielectric sheet and outer dielectric sheet opposite the substrate are coplanar.
3 more elements
Dependencies are inferred from the claim text.