Electromagnetic-wave-absorbing film and its production apparatus, and near-field electromagnetic wave absorber comprising such electromagnetic-wave-absorbing film
AssigneeSeiji KAGAWA
InventorsSeiji Kagawa, Yoichiro KAGAWA
Life of this patent
Estimating the term…
Abstract
An electromagnetic-wave-absorbing film comprising a plastic film and a thin metal film formed on a surface of the plastic film, the thin metal film being provided with large numbers of substantially parallel linear scratches with irregular widths and intervals in two directions, the linear scratches having high-density regions and low-density regions alternately in each direction, and the high-density regions being distributed in a lattice pattern by the crossing of linear scratches in both directions.
Claims18
An electromagnetic-wave-absorbing film comprising a plastic film and a thin metal film formed on a surface of said plastic film,
- said thin metal film being provided with large numbers of substantially parallel linear scratches with irregular widths and intervals in two directions,
- said linear scratches having high-density regions and low-density regions alternately in each direction, and
- said high-density regions being distributed in a lattice pattern by the crossing of linear scratches in both directions.
An apparatus for producing an electromagnetic-wave-absorbing film comprising a plastic film and a thin metal film formed on a surface of said plastic film, said thin metal film being provided with large numbers of substantially parallel linear scratches with irregular widths and intervals in two directions, with high-density regions and low-density regions of linear scratches alternately in each direction, and said high-density regions being distributed in a lattice pattern by the crossing of linear scratches in both directions,
- said apparatus comprising
- two pattern rolls,
- a means for conveying said plastic film such that said thin metal film is brought into sliding contact with two pattern rolls, and
- push rolls for pressing said thin metal film onto said pattern rolls,
- said two pattern rolls being oriented oppositely with respect to the transverse direction of said plastic film, in a plane in which they are in sliding contact with said thin metal film,
- the outer peripheral surface of each pattern roll being provided with linear-scratch-forming regions and non-forming regions alternately in the peripheral direction, and
- said linear-scratch-forming regions having large numbers of high-hardness, fine particles on the surface.
An apparatus for producing an electromagnetic-wave-absorbing film comprising a plastic film and a thin metal film formed on a surface of said plastic film, said thin metal film being provided with large numbers of substantially parallel linear scratches with irregular widths and intervals in two directions, with high-density regions and low-density regions of linear scratches alternately in each direction, and said high-density regions being distributed in a lattice pattern by the crossing of linear scratches in both directions,
- said apparatus comprising
- two pattern rolls each having large numbers of high-hardness, fine particles on the entire outer peripheral surface,
- a means for conveying said plastic film along said pattern rolls, and
- push rolls arranged on both sides of each pattern roll,
- said two pattern rolls being oriented oppositely with respect to the transverse direction of said plastic film, in a plane in which they are in sliding contact with said thin metal film, and
- said apparatus further comprising a means for moving each pattern roll and/or push rolls on both sides thereof perpendicularly to said thin metal film, such that each pattern roll is brought into sliding contact with said thin metal film intermittently.
A near-field electromagnetic wave absorber comprising at least one plastic film and first and second thin metal films,
- said first thin metal film being provided with large numbers of substantially parallel linear scratches with irregular widths and intervals in two directions, having high-density regions in which said linear scratches are formed at a high density and low-density regions in which said linear scratches are formed at a low density alternately in each direction,
- said high-density regions being distributed in a lattice pattern by the crossing of said linear scratches in both directions, and
- said second thin metal film being provided with large numbers of substantially parallel, intermittent, linear scratches with irregular widths and intervals in two directions on the entire area.
Dependencies are inferred from the claim text.