Apparatus for ion energy analysis of plasma processes
OwnerPaul SCULLIN, James DOYLE +3inventors
InventorsPaul SCULLIN, James DOYLE, JJ LENNON, David GAHAN, Tigran POGHOSYAN
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Abstract
An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system, in one example, comprises a substrate for placement in the plasma processing system and exposed to the plasma, an ion energy analyser disposed in the substrate for measuring the ion energy distribution at the substrate surface during plasma processing, the analyser comprising a plurality of conductive grids, and a collection electrode, each grid separated by an insulation layer, a high voltage generating circuit and a resistor.
Claims17
An apparatus for obtaining ion energy distribution, IED, measurements in a plasma processing system comprising:
- a substrate for placement in the plasma processing system and exposure to the plasma, the substrate having an ion energy analyser disposed therein for measuring the ion energy distribution at the substrate surface during plasma processing, the ion energy analyser comprising a plurality of conductive grids, and a collection electrode, each conductive grid separated by an insulating layer;
- a high voltage generating circuit within the substrate and configured to take the output voltage of a battery to power the high voltage generating circuit and apply a voltage to a first conductive grid of the plurality of conductive grids;
- and
- a resistor in series between the first conductive grid and the high voltage generating circuit.
Dependencies are inferred from the claim text.