Method and system for optimizing optical inspection of patterned structures

A method for use in metrology of a patterned structure, the method comprising:

• receiving, by a data input utility:
• a first type of data related to the patterned structure, the first type of data was obtained by a first type of metrology system and comprises first type measurements and first geometrical information regarding the patterned structure;
• and a second type of data related to the patterned structure, the second type of data was obtained by a second type of metrology system and comprises second type measurement results and second geometrical information regarding the patterned structure;
• the second type of metrology system differs from the first type of metrology system;
• and
• determining, by a data processing and analyzing utility, values of parameters of interest based on the first type of data and the second type of data;
• wherein the parameters of interest comprise (i) a first parameter of interest that is related to the first type of metrology and (ii) a second parameter of interest that is related to the second type of metrology;
• wherein the first parameter of interest is a parameter of a first model for interpreting the first type of measurements;
• wherein the second parameter of interest is a parameter of a second model for interpreting the second type of measurements;
• wherein the determining, by the data processing and analyzing utility, of the values of parameters of interest comprises applying an iterative process, wherein the iterative process comprises updating the first model based on the second type of data to provide a currently updated first model, and updating the second model based on the first type of data;
• wherein the first type measurements and the second type measurements are taken from measurement sites of a substrate that comprises the patterned structure;
• wherein the method comprises:
• adjusting the first type measurements by using correlation curves to provide adjusted first type measurements;
• using the adjusted first type measurements during a data interpretation process applied on the second type of data;
• and
• reducing a number of floating parameters of the data interpretation process to provide a reduced number of floating parameters by stabilizing measurements of non-floating parameters;
• wherein each of the non-floating parameters has a greater impact on the first type measurements than an impact of each of the reduced number of floating parameters.

A non-transitory computer readable medium for use in metrology of a patterned structure, the non-transitory computer readable medium stores instructions executable by a processor for:

• receiving, by a data input utility:
• a first type of data related to the patterned structure, the first type of data was obtained by a first type of metrology system and comprises first type measurements and first geometrical information regarding the patterned structure;
• and a second type of data related to the patterned structure, the second type of data was obtained by a second type of metrology system and comprises second type measurement results and second geometrical information regarding the patterned structure;
• the second type of metrology system differs from the first type of metrology system;
• and
• determining, by a data processing and analyzing utility, values of parameters of interest based on the first type of data and the second type of data;
• wherein the parameters of interest comprise (i) a first parameter of interest that is related to the first type of metrology and (ii) a second parameter of interest that is related to the second type of metrology;
• wherein the first parameter of interest is a parameter of a first model for interpreting the first type of measurements;
• wherein the second parameter of interest is a parameter of a second model for interpreting the second type of measurements;
• wherein the determining, by the data processing and analyzing utility, of the values of parameters of interest comprises applying an iterative process, wherein the iterative process comprises updating the first model based on the second type of data to provide a currently updated first model, and updating the second model based on the first type of data;
• wherein the first type measurements and the second type measurements are taken from measurement sites of a substrate that comprises the patterned structure;
• wherein the method comprises:
• adjusting the first type measurements by using correlation curves to provide adjusted first type measurements;
• using the adjusted first type measurements during a data interpretation process applied on the second type of data;
• and
• reducing a number of floating parameters of the data interpretation process to provide a reduced number of floating parameters by stabilizing measurements of non-floating parameters;
• wherein each of the non-floating parameters has a greater impact on the first type measurements than an impact of each of the reduced number of floating parameters.