Digital photolithography system, components thereof and related methods

A photolithography system, comprising:

• one or more exposure unit configured to rotate by a rotation assembly;
• a platform spaced apart from the one or more exposure unit, wherein the platform is configured to move in an x-direction, a y-direction and a z-direction with respect to the one or more exposure unit;
• the rotation assembly comprising:
• a first contact mechanism configured to stabilize movement of the one or more exposure unit, the first contact mechanism comprising a kinematic socket configured to support the one or more exposure unit, the kinematic socket comprising a socket seat and a sphere received in the socket seat, wherein the socket seat is configured to support a load of the one or more exposure unit during translational movement and the sphere is a pivot point for tip and tilt movement;
• and
• a motor configured to rotate the exposure unit via the kinematic socket,
• wherein the rotation assembly is mounted to the photolithography system by at least three contact points.