Post development treatment for metal-oxide photoresists
AssigneeApplied Materials, Inc.
InventorsMADHUR SACHAN, BO XIE, LAKMAL CHARIDU KALUTARAGE, ZHENXING HAN, TZU SHUN YANG, LI-QUN XIA
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Abstract
Embodiments disclosed herein include a method of post development treatment of a metal-oxide photoresist. In an embodiment, a method includes depositing a metal-oxide photoresist over a substrate, exposing the metal-oxide photoresist with an extreme ultra-violet (EUV) exposure to form exposed regions and unexposed regions, developing the exposed metal-oxide photoresist, and performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist.
Claims20
A method, comprising:
- depositing a metal-oxide photoresist over a substrate;
- exposing the metal-oxide photoresist with an extreme ultra-violet (EUV) exposure to form exposed regions and unexposed regions;
- developing the exposed metal-oxide photoresist;
- and
- performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist.
A method, comprising:
- depositing a metal-oxide photoresist over a substrate;
- exposing the metal-oxide photoresist with an extreme ultra-violet (EUV) exposure to form exposed regions and unexposed regions;
- developing the exposed metal-oxide photoresist;
- performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist;
- and
- exposing the coated developed metal-oxide photoresist with an ultra-violet (UV) exposure.
A system, comprising:
- a chamber for receiving a developed metal-oxide photoresist thereon, performing a surface treatment of the developed metal-oxide photoresist to form a coating on the developed metal-oxide photoresist, and performing an ultra-violet (UV) exposure of the developed metal-oxide photoresist.
Dependencies are inferred from the claim text.