Semiconductor measurement apparatus and method of manufacturing semiconductor device using semiconductor measurement apparatus

Abstract

A method of manufacturing a semiconductor device using a semiconductor measurement apparatus includes extracting an interference pattern using a microsphere, and measuring a distance between a specimen and the microsphere, based on the interference pattern. A semiconductor measurement apparatus includes a light source configured to output at least one light, a scanner having a microsphere-objective lens, the scanner configured to allow the at least one light to be incident on a specimen, a spectrometer configured to obtain a spectrum of light reflected from the specimen; and a distance measurement apparatus configured to calculate a microsphere-to-specimen distance by analyzing a change in the spectrum.

Dependencies are inferred from the claim text.