Substrate drying device, substrate processing device, and substrate manufacturing method
AssigneeDaikin Finetech, Ltd.
InventorsYasunori DEGUCHI, Ai ARAKI, Yoshikazu FUTAMATA
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AssigneeDaikin Finetech, Ltd.
InventorsYasunori DEGUCHI, Ai ARAKI, Yoshikazu FUTAMATA
Estimating the term…
A substrate drying device (2A, 2) includes a dry tank (6) in which a plurality of substrates (4) are aligned at a predetermined pitch (P1), a treatment liquid supply part (8, 10) that supplies a treatment liquid (W) to the dry tank (6), an organic solvent supply part (16, 17) that supplies an organic solvent (CV) to the dry tank (6), and an inert gas supply part (18) that supplies an inert gas (N) to the dry tank (6), the dry tank (6) being provided with a substrate support part (34) that supports the plurality of substrates (4), and with an interval securing member (36, 37) driven so as to come proximate to ends (41, 42, 44) of the plurality of substrates (4) supported by the substrate support part (34) and secure an interval between the substrates (4).
A substrate drying device comprising:
A substrate manufacturing method comprising:
Dependencies are inferred from the claim text.