Method of Metallization by a Nickel or Cobalt Alloy for the Manufacture of Semiconductor Devices
OwnerMikailou THIAM, Hermine Marie BERTHON +1inventors
InventorsMikailou THIAM, Hermine Marie BERTHON, Amine LAKHDARI
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Abstract
A method of metallizing a semiconductor for the manufacture of three-dimensional semiconductor devices such as integrated circuits or storage memories. The metallization process includes a step of activating the surface, of a mineral oxide substrate with a noble metal, such as palladium, followed by a step of depositing a nickel or cobalt alloy containing boron and at least one of phosphorus and tungsten by electroless deposition.
Claims21
A process for metallizing at least a surface of a mineral oxide substrate with a nickel or cobalt alloy comprising at least two elements, the first element being boron and the second element being selected from phosphorus and tungsten, said metallization process comprising the steps of:
- a) activating the surface of the mineral oxide substrate with a noble metal activation solution, and thereafter
- b) contacting said surface of the mineral oxide substrate with an electroless nickel or cobalt solution to form the nickel or cobalt alloy, the electroless nickel or cobalt solution comprising:
- i) nickel or cobalt ions,
- ii) a nickel or cobalt ion reducing agent comprising boron, and
- iii) a compound comprising a doping element selected from phosphorus and tungsten,
- wherein the compound comprising the doping element is in a sufficient amount so that the dopant element represents between 1% and 10% atomic of the nickel or cobalt alloy.
A process for metallizing at least a surface of a mineral oxide substrate with a nickel or cobalt alloy comprising at least two elements, the first element being boron and the second element being selected from phosphorus and tungsten, said metallization process comprising the steps of:
- a) activating the surface of the mineral oxide substrate with a noble metal activation solution, and thereafter
- b) contacting said surface of the mineral oxide substrate with an electroless nickel or cobalt solution to form the nickel or cobalt alloy, the electroless nickel or cobalt solution consists essentially of:
- i) nickel or cobalt ions;
- ii) a nickel or cobalt ion reducing agent comprising boron;
- and
- iii) a compound comprising a doping element selected from phosphorus and tungsten,
- wherein the compound comprising the doping element is in a sufficient amount so that the dopant element represents between 1% and 10% atomic of the nickel or cobalt alloy.
Dependencies are inferred from the claim text.