Vapor deposition systems and methods, and nanomaterials formed by vapor deposition

A system comprising:

• a support member constructed to hold one or more batches of solid-state precursors thereon;
• a baffle member disposed over and spaced from the support member by a first distance along a first direction, the baffle and support members being constructed and arranged to define a confined heating volume with at least one exit window;
• a deposition substrate disposed over and spaced from the baffle member by a second distance along the first direction;
• and
• a controller comprising one or more processors and one or more computer readable storage media,
• wherein the baffle member comprises a heating element, and
• the one or more computer readable storage media store instructions that, when executed by the one or more processors, cause the controller to control the heating element to subject a batch of solid-state precursors within the confined heating volume to a first temperature greater than 2200 K, so as to convert at least some of the solid-state precursors into a vapor that exits the confined heating volume via the at least one exit window, flows around the baffle member into contact with a surface of the deposition substrate, and solidifies on said deposition substrate surface.

A system comprising:

• a support member constructed to hold one or more batches of solid-state precursors thereon;
• a baffle member disposed over and spaced from the support member by a first distance along a first direction, the baffle and support members being constructed and arranged to define a confined heating volume with at least one exit window;
• a deposition substrate disposed over and spaced from the baffle member by a second distance along the first direction;
• a heating system;
• and
• a controller operatively coupled to the heating system, the controller comprising one or more processors and one or more computer readable storage media storing instructions that, when executed by the one or more processors, cause the controller to control the heating system to subject a batch of solid-state precursors within the confined heating volume to a first temperature greater than 2200 K, so as to convert at least some of the solid-state precursors into a vapor that exits the confined heating volume via the at least one exit window, flows around the baffle member into contact with a surface of the deposition substrate, and solidifies on said deposition substrate surface.