Silicon precursor compound and preparation method therefor, and silicon-containing thin film preparation method using silicon precursor
AssigneeMerck Patent GmbH
InventorsByeong-IL Yang, Hee-Yeon Jeong, Yeong-Ju Seong, Seong-Hak Cheon, Joo-Yong Kim, Young-Hun Byun
Life of this patent
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Abstract
A silicon precursor compound according to Formula I as described herein is used to form a silicon-containing thin film having excellent quality. A preparation method therefor, and a silicon-containing thin film preparation method using the silicon precursor compound are also described.
Claims19
A silicon precursor compound, which is represented by the following Formula 1:
- wherein R0, R5, and R6 are each independently a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms or an isomer thereof, R1, R2, R3, and R4 are each independently hydrogen (H), a halogen, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms, and X is hydrogen (H) or a halogen.
A method for preparing a silicon precursor compound, which comprises:
- reacting a chlorosilane derivative with a primary amine to form a first compound;
- reacting the first compound with an alkyl-lithium (Alkyl-Li) to form a second compound comprising lithium;
- and
- reacting the second compound with a silane compound to prepare a silicon precursor compound represented by the following Formula 1:
- wherein R0, R5, and R6 are each independently a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms or an isomer thereof, R1, R2, R3, and R4 are each independently hydrogen (H), a halogen, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms, and X is hydrogen (H) or a halogen.
A method for preparing a silicon-containing thin film, which comprises forming the silicon-containing thin film using a silicon precursor compound represented by the following Formula 1:
- wherein R0, R5, and R6 are each independently a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms or an isomer thereof, R1, R2, R3, and R4 are each independently hydrogen (H), a halogen, or a linear or branched, saturated or unsaturated hydrocarbon group having 1 to 4 carbon atoms, and X is hydrogen (H) or a halogen.
Dependencies are inferred from the claim text.