Chemical vapor deposition device with adherence disruption feature and methods of using the same

A reactor system for coating a plurality of particles, the reactor system comprising:

• a reactor vessel configured to house the plurality of particles therein and configured to permit a flow of process gas there through to coat the plurality of particles, the reactor vessel comprising:
• an inlet at a first end of the reactor vessel;
• an outlet at a second end of the reactor vessel;
• one or more side walls extending between the inlet and the outlet of the reactor vessel, the one or more side walls comprising an interior surface that defines an internal volume;
• a processing chamber within the reactor vessel positioned between the inlet and the outlet of the reactor vessel, the processing chamber including an inlet filter, an outlet filter, and chamber walls, the processing chamber configured to receive and retain the plurality of particles within the processing chamber to undergo a coating process in a fluidized bed environment;
• and
• one or more agitator(s) associated with or coupled to the reactor vessel and configured to deliver mechanical energy to the reactor vessel to reduce the plurality of particles from at least one of agglomerating to one another and adhering to the chamber walls, adhering to the inlet filter, and adhering to the outlet filter, the one or more agitator(s) comprising a sonicator configured to deliver mechanical energy, and a wave propagating structure coupled to the sonicator and the reactor vessel.