Novel 2-in-1 (uv-assisted and plasma enhanced) ald & ale chamber design
AssigneeSky Tech Inc.
InventorsJUNG-HUA CHANG, TA-HAO KUO, CHING-LIANG YI
Life of this patent
Estimating the term…
Loading patent…
AssigneeSky Tech Inc.
InventorsJUNG-HUA CHANG, TA-HAO KUO, CHING-LIANG YI
Estimating the term…
A UV-assisted and plasma-enhanced process method includes: providing a lower chamber and a reaction space defined therein; providing an upper cover, wherein the upper cover has a window and vent holes; sealing a chamber opening of the lower chamber with the upper cover to form a reaction chamber; providing an outer tube body and an inner tube body disposed in the outer tube body, the outer tube body covering the window and the vent holes, and the inner tube body connected to the window; providing a UV light source at a top end of the inner tube body; providing an induction coil around the outer tube body; inducing a first gas to a first gas chamber in the inner tube body and a second gas to the second gas chamber between the inner and outer tube bodies; and activating the UV light source and the induction coil optionally.
A UV-assisted and plasma-enhanced process method comprising:
A 2-in-1 optoelectronic assisted process chamber design, comprising:
Dependencies are inferred from the claim text.