Apparatus and methods of sublimation for repeatable uniform or patterned deposition of matrix crystals on solid substrates

An apparatus for sublimation and deposition of a chemical, the apparatus comprising:

• a vacuum chamber where in operation the chamber is below atmospheric pressure;
• a template comprising a planar surface containing the chemical to be sublimed, wherein the template is located within the vacuum chamber;
• a heating element configured to heat the template and sublimate the chemical on the planar surface of the template;
• a substrate retaining device;
• and
• a surface in contact with the substrate retaining device, wherein:
• the planar surface of the template is an insert placed into a pan structure;
• the substrate retaining device is located within the vacuum chamber;
• the surface in contact with the substrate retaining device is held at a lower temperature than the template when the template is heated by the heating element;
• and
• the substrate retaining device is configured to position a substrate such that compound sublimated from the planar surface of the template can be deposited on the substrate.