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US 2025/0051643 A1Published application
Surfactants for electronics
AssigneeAdvanSix Resins & Chemicals LLC
InventorsEdward Asirvatham, Kavssery Parameswaran Ananthapadmanabhan, Harshita Kumari, Ramana Reddy Mittapalli, Suchitra Dilipkumar Panigrahi
Life of this patent
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Abstract
Pre-texturing agents, etchants, and photoresist stripping agents may be formulated to include one or more surfactants, from one or more surfactant classes, such as siloxane derivatives of amino acids that have surface-active properties.
Claims13
A formulation for a pre-texturing agent, comprising:
- at least one surfactant of Formula I:
- wherein R1 and R2 are the same or different, and comprise at least one group selected from the group consisting of C1-C6 alkyl, optionally the C1-C6 alkyl may include one or more of oxygen, nitrogen, or sulfur atoms or groups that include at least one of these atoms, and the alkyl chain may be optionally substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, sulfonate, carbonyl, carboxyl, and carboxylate;
- R3 is selected from the group consisting of alkenyl, alkynyl, ester, alcohol, aryl alkyl, alkoxy alkyl ether, alkyl phosphate, C3-C8 carboxylic acid, C1-C10 alkyl benzoic acid, and a C1-C6 linker attached to a second molecule of Formula I, wherein the second molecule is the same or different;
- n is an integer from 1 to 12;
- and
- X is selected from the group consisting of chloride, bromide, and iodide;
- and
- at least one of one or more solvents and one or more defoaming agents.
5 more elements
A formulation for an etchant, comprising:
- at least one surfactant of Formula I:
- wherein R1 and R2 are the same or different, and comprise at least one group selected from the group consisting of C1-C6 alkyl, optionally the C1-C6 alkyl may include one or more of oxygen, nitrogen, or sulfur atoms or groups that include at least one of these atoms, and the alkyl chain may be optionally substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, sulfonate, carbonyl, carboxyl, and carboxylate;
- R3 is selected from the group consisting of alkenyl, alkynyl, ester, alcohol, aryl alkyl, alkoxy alkyl ether, alkyl phosphate, C3-C8 carboxylic acid, C1-C10 alkyl benzoic acid, and a C1-C6 linker attached to a second molecule of Formula I, wherein the second molecule is the same or different;
- n is an integer from 1 to 12;
- and
- X is selected from the group consisting of chloride, bromide, and iodide;
- and hydrofluoric acid (HF).
4 more elements
A formulation for a photoresist stripping formulation, comprising:
- at least one surfactant of Formula I:
- wherein R1 and R2 are the same or different, and comprise at least one group selected from the group consisting of C1-C6 alkyl, optionally the C1-C6 alkyl may include one or more of oxygen, nitrogen, or sulfur atoms or groups that include at least one of these atoms, and the alkyl chain may be optionally substituted with one or more substituents selected from the group consisting of hydroxyl, amino, amido, sulfonyl, sulfonate, carbonyl, carboxyl, and carboxylate;
- R3 is selected from the group consisting of alkenyl, alkynyl, ester, alcohol, aryl alkyl, alkoxy alkyl ether, alkyl phosphate, C3-C8 carboxylic acid, C1-C10 alkyl benzoic acid, and a C1-C6 linker attached to a second molecule of Formula I, wherein the second molecule is the same or different;
- n is an integer from 1 to 12;
- and
- X is selected from the group consisting of chloride, bromide, and iodide;
- and
- an alkanolamine.
5 more elements
Dependencies are inferred from the claim text.