Back to results
US 2025/0051604 A1Published application
Hardmask composition, hardmask layer and method of forming patterns
AssigneeSamsung SDI Co., Ltd.
InventorsSunghwan KIM, Sanghee PARK, Hyejeong KIM, Seil CHOI, Soohee KIM
Life of this patent
Estimating the term…
Abstract
A hardmask composition, a hardmask layer manufactured from the hardmask composition, and a method of forming patterns using the hardmask layer manufactured from the hardmask composition, the hardmask composition includes a polymer including a structural unit represented by the following Chemical Formula 1; and a solvent,
Claims15
A hardmask composition, comprising:
- a polymer including a structural unit represented by Chemical Formula 1;
- and
- a solvent:
- wherein, in Chemical Formula 1,
- A is a substituted or unsubstituted aromatic group, a substituted or unsubstituted heteroaromatic group, a group in which two or more substituted or unsubstituted aromatic groups or substituted or unsubstituted heteroaromatic groups are linked by a single bond or —CRxRy—, in which Rx and Ry are each independently a substituted or unsubstituted aromatic group or a substituted or unsubstituted heteroaromatic group, Rx and Ry being separate or linked to form a fused ring, or a combination thereof,
- B is a group represented by Chemical Formula 2, and
- * is a linking point:
- wherein, in Chemical Formula 2,
- X1 and X2 are each independently a substituted or unsubstituted C1 to C20 saturated or unsaturated aliphatic hydrocarbon group, a substituted or unsubstituted C3 to C20 saturated or unsaturated alicyclic hydrocarbon group, a substituted or unsubstituted C1 to C20 saturated or unsaturated heteroaliphatic hydrocarbon group, a substituted or unsubstituted C2 to C20 saturated or unsaturated heteroalicyclic hydrocarbon group, a substituted or unsubstituted C6 to C30 aromatic group, a substituted or unsubstituted C6 to C30 heteroaromatic group, or a combination thereof, X1 and X2 being separate or being linked to each other to form a substituted or unsubstituted C3 to C30 hydrocarbon ring group,
- R1 to R4 are each independently deuterium, a hydroxy group, a halogen atom, —NRaRb, in which Ra and Rb are each independently hydrogen or a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C1 to C20 alkoxy group, a substituted or unsubstituted C1 to C10 alkyl group, a substituted or unsubstituted C2 to C10 alkenyl group, a substituted or unsubstituted C2 to C10 alkynyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C3 to C20 cycloalkenyl group, a substituted or unsubstituted C3 to C20 cycloalkynyl group, a substituted or unsubstituted C3 to C20 hetero cycloalkyl group, a substituted or unsubstituted C6 to C20 aryl group, a substituted or unsubstituted C6 to C20 heteroaryl group, or a combination thereof,
- m1 to m4 are each independently an integer of 0 to 4, and
- n1 and n2 are each independently an integer of 1 to 4.
9 more elements
Dependencies are inferred from the claim text.