Pad conditioning brush
Assignee3M Innovative Properties Company
InventorsUma Rames Krishna Lagudu, Samad Javid, Terry R. Hobbs, Stephen R. Alexander, Jeremy K. Dworshak, Brian W. Lueck
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Abstract
Pad conditioning brushes are described. In particular, pad conditioning brushes including a carrier layer and a plurality of abrasive particle-free brush bristles extending from the carrier layer are described. The carrier layer and the plurality of brush bristles form a unitary body. Such brushes may provide excellent performance compared to traditional conditioning disks.
Claims20
A pad conditioning brush, comprising:
- a carrier layer;
- a plurality of brush bristles extending from the carrier layer;
- wherein the plurality of brush bristles are abrasive particle-free;
- wherein the carrier layer and the plurality of brush bristles form a unitary body;
- where the pad conditioning brush has sufficient stiffness to texture a chemical mechanical polishing pad with a hardness of 20 Shore A.
The pad conditioning brush of claim 6, wherein the pad conditioning brush has sufficient stiffness to texture a chemical mechanical polishing pad with a hardness of 65 Shore D.
A pad conditioning brush, comprising:
- a carrier layer;
- a plurality of brush bristles extending from the carrier layer,
- wherein the plurality of brush bristles are abrasive particle-free;
- wherein the carrier layer and the plurality of brush bristles form a unitary body;
- wherein the plurality of brush bristles include a composite including a polymer and an impact modifier.
A method of conditioning a chemical mechanical polishing pad, comprising:
- providing a pad conditioner including a unitary working surface that is metal-free and abrasive particle-free;
- providing a chemical mechanical polishing pad;
- contacting the pad conditioner to the chemical mechanical polishing pad;
- and
- texturing the chemical mechanical polishing pad.
Dependencies are inferred from the claim text.