Active Transmission Measurement of Optical Metasurface during Etch Removal Process
OwnerThomas C Hutchens, Hui Cai +1inventors
InventorsThomas C Hutchens, Hui Cai, Lawrence B. Fischel
Life of this patent
Estimating the term…
Abstract
Embodiments of the present disclosure include techniques for forming metasurfaces on optical materials. In one embodiment, light is generated by a light source and coupled through an optical material including a metasurface during an etching process to form the metasurface. Transmission through the optical material and metasurface is performed during the etching process to maximize the transmission of the metasurface. The present disclosure includes apparatuses and method for forming metasurfaces on optical materials.
Claims20
An apparatus comprising:
- an etch chamber;
- an optical source configured to generate a light having one or more wavelengths;
- at least one optical material comprising a first surface and a second surface, wherein the second surface is opposite the first surface, the first surface comprising a metasurface, the optical material configured to couple the light through the optical material including the first surface and the second surface;
- and
- an optical detector configured to detect the light transmitted through the optical material,
- wherein the optical source generates the light during a metasurface etch process to form the metasurface, and the optical detector senses a transmittance of the light through the optical material during the metasurface etch process.
A method of forming an anti-reflective metasurface on an optical material comprising:
- in an etch chamber,
- generating, by an optical source, a light having one or more wavelengths during an anti-reflective metasurface etch process to form the anti-reflective metasurface;
- coupling the light through the optical material including a first surface of the optical material and a second surface of the optical material, wherein the second surface is opposite the first surface, the first surface comprising the anti-reflective metasurface, the optical material configured to couple the light through the optical material including the first surface and the second surface;
- sensing a transmittance of the light transmitted through the optical material in an optical detector during the anti-reflective metasurface etch process;
- and
- determining a maximum transmittance of the light transmitted through the optical material.
Dependencies are inferred from the claim text.