Substrate treatment apparatus
AssigneeDeviceeng Co., Ltd.
InventorTaek Youb Lee
Life of this patent
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Abstract
The present disclosure relates to a substrate treatment apparatus including: a substrate treatment apparatus including: a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst; a fluid supply unit for supplying treatment liquid to the substrate; a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way as to surround the chuck base; an ascending and descending unit for moving the bowl assembly up and down; and a shutter unit disposed on top of the outermost bowl of the bowl assembly to adjust a radius of an air flow inlet through which air flow passes toward the substrate.
Claims8
A substrate treatment apparatus comprising:
- a chuck base rotating together with a substrate in a state of supporting the substrate thereagainst;
- a fluid supply unit for supplying treatment liquid to the substrate;
- a bowl assembly having a plurality of bowls that overlap outward in a radial direction with respect to the center of the substrate in such a way as to surround the chuck base;
- an ascending and descending unit for moving the bowl assembly up and down;
- and
- a shutter unit disposed on top of the outermost bowl of the bowl assembly to adjust a radius of an air flow inlet through which air flow passes toward the substrate.
Dependencies are inferred from the claim text.