Model-based scheduling for substrate processing systems
AssigneeLam Research Corporation
InventorsRaymond Chau, Chung-Ho Huang, Henry Chan, Vincent Wong, Yu Ding, Ngoc-Diep Nguyen, Gerramine Manuguid
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AssigneeLam Research Corporation
InventorsRaymond Chau, Chung-Ho Huang, Henry Chan, Vincent Wong, Yu Ding, Ngoc-Diep Nguyen, Gerramine Manuguid
Estimating the term…
For etching tools, a neural network model is trained to predict optimum scheduling parameter values. The model is trained using data collected from preventive maintenance operations, recipe times, and wafer-less auto clean times as inputs. The model is used to capture underlying relationships between scheduling parameter values and various wafer processing scenarios to make predictions. Additionally, in tools used for multiple parallel material deposition processes, a nested neural network based model is trained using machine learning. The model is initially designed and trained offline using simulated data and then trained online using real tool data for predicting wafer routing path and scheduling. The model improves accuracy of scheduler pacing and achieves highest tool/fleet utilization, shortest wait times, and fastest throughput.
A system for processing semiconductor substrates in a tool comprising a plurality of processing chambers configured to process the semiconductor substrates according to a recipe, the system comprising:
A tool for processing semiconductor substrates comprising:
A system for optimizing throughput and wait times during processing semiconductor substrates in a semiconductor processing tool, the system comprising:
Dependencies are inferred from the claim text.