Imprint apparatus, imprint method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorNOZOMU HAYASHI
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorNOZOMU HAYASHI
Estimating the term…
An imprint apparatus that can curb a decrease in throughput is provided. The imprint apparatus curs and forms a pattern of an imprint material sequentially in a plurality of shot areas on a substrate using a mold including a patterned part and includes: an alignment measurement unit configured to measure a relative position between the substrate and the mold by detecting a mark formed on the substrate and a mark formed on the mold; an alignment illumination unit including a light amount adjusting mechanism for adjusting a light amount of light emitted from a light source and configured to illuminate a marks on the mold and the substrate such that a marks are able to be detected by the alignment measurement unit; and a control unit configured to cure the imprint material in a state in which the mold and the substrate have been aligned on the basis of a measurement result from the alignment measurement unit and then to perform control such that adjustment of the light amount adjusting mechanism is started such that an illumination condition when the alignment illumination unit illuminates a shot area on which a pattern is to be next formed is satisfied.
An imprint apparatus that cures and forms a pattern of an imprint material sequentially in a plurality of shot areas on a substrate using a mold including a patterned part, the imprint apparatus comprising:
An imprint method of curing and forming a pattern of an imprint material sequentially in a plurality of shot areas on a substrate using a mold including a patterned part, the imprint method comprising:
An article manufacturing method that is performed by an imprint apparatus that cures and forms a pattern of an imprint material sequentially in a plurality of shot areas on a substrate using a mold including a patterned part and that includes
Dependencies are inferred from the claim text.