Electrochemical Layer Deposition by Anode Array Using Measurement Information

An apparatus comprising:

• a reaction chamber configured to retain an electrolyte;
• an anode array containing a plurality of anodes stationary with respect to one another, the anode array disposed in the reaction chamber and configured to be immersed in the electrolyte such that the plurality of anodes are in fluid contact with one another through the electrolyte, and such that the plurality of anodes cause a deposition of a unitary layer structure or a series of unitary layer structures;
• a cathode disposed in the reaction chamber and configured such that the cathode is in fluid and in contact with the plurality of anodes through the electrolyte;
• a system for electro-mechanically positioning either the anode array the cathode, or both to control the distance between the anode array and the cathode;
• at least one sensor for individually measuring an electrical current and or voltage of one of the plurality of anodes;
• and
• a microcontroller, coupled to the system for electro-mechanically positioning either the anode array, the cathode, or both, coupled to the at least one sensor, and coupled to a source of a layer slice information, programmed with instructions that when executed by the microcontroller cause the microcontroller to:
• (i) control the current or voltage applied to one anode of the plurality of anodes;
• (ii) measure the current or the voltage of one anode of the plurality of anodes using the at least one sensor to create a measurement information;
• (iii) interpret the measurement information causing the microcontroller to send signals to one or more anodes in the anode array to modify their voltage and/or current to cause a localized deposition of the unitary layer structure or the series of unitary layer structures.