Image sensor

An image sensor comprising:

• a substrate comprising a first surface and a second surface;
• a plurality of pixel groups, each of the plurality of pixel groups comprising a plurality of photodiodes provided in the substrate;
• a pixel isolation pattern provided between the plurality of photodiodes in the substrate;
• an element isolation pattern provided in the substrate, the element isolation pattern extending inside the substrate from the first surface of the substrate;
• and
• an auxiliary isolation pattern provided in the substrate, the auxiliary isolation pattern extending inside the substrate from the second surface of the substrate,
• wherein the pixel isolation pattern comprises:
• an outer isolation pattern provided between the plurality of pixel groups, and
• an inner isolation pattern comprising:
• a first inner isolation pattern provided between two first adjacent photodiodes, among the plurality of photodiodes, and
• a second inner isolation pattern provided between two second adjacent photodiodes, among the plurality of photodiodes, and
• wherein the auxiliary isolation pattern is provided between the outer isolation pattern and one of the first and the second inner isolation patterns that are spaced apart from each other or between the first inner isolation pattern and the second inner isolation pattern that are spaced apart from each other.

An image sensor comprising:

• a substrate comprising a first surface and a second surface;
• a plurality of pixel groups, each of the plurality of pixel groups comprising a plurality of photodiodes provided in the substrate;
• a plurality of pixel isolation patterns, each provided between adjacent photodiodes among the plurality of photodiodes in the substrate;
• and
• an auxiliary isolation pattern provided in the substrate, the auxiliary isolation pattern extending inside the substrate from the first surface of the substrate and provided between two pixel isolation patterns, among the plurality of pixel isolation patterns spaced apart from each other,
• wherein each of the plurality of pixel isolation patterns comprises:
• an isolation conductive pattern extending inwardly from the second surface of the substrate,
• a capping insulation pattern extending inwardly from the first surface of the substrate, and
• an isolation insulation pattern provided on side surfaces of the isolation conductive pattern and the capping insulation pattern.