Uv-curable precursor solutions for deposition of mixed metal oxide films containing titanium, and optical elements formed by liquid phase deposition of metal oxide films

Abstract

Examples are disclosed that relate to the use of acid-stabilized precursor solutions for forming low-cracking and crack-free titanium-containing oxide films by liquid phase deposition. One example provides a method for forming a titanium-containing oxide film by liquid-phase deposition. The method comprises film a substrate with an acid-stabilized aqueous precursor solution to form a film. The acid-stabilized aqueous precursor solution comprises titanium ions, one or more other metal ions, a photolyzable and/or pyrolyzable ligand, and an acid. The method further comprises exposing the film to one or more of heat or light. Examples are also disclosed that relate to forming optical devices using liquid phase deposition of metal oxide films.

Dependencies are inferred from the claim text.