Substrate treatment system

A substrate treatment system that performs treatment on a substrate comprising:

• a stocker device including a load port for loading and unloading a carrier storing a plurality of substrates, a first carrier placement shelf on which the carrier is placed, and a first transport robot that transports the carrier;
• a batch treatment device that collectively performs treatment on the plurality of substrates;
• a single-wafer treatment device that performs treatment on the plurality of substrates one by one;
• an interface device including a second carrier placement shelf on which the carrier is placed and a second transport robot that transports the carrier;
• and
• a carrier transport mechanism that transports the carrier between a stocker device side position on the stocker device side and an interface device side position on the interface device side, wherein
• the stocker device, the single-wafer treatment device, the interface device, and the batch treatment device are disposed in a line and linearly in this order,
• the first transport robot transports the carrier, in which a substrate before treatment is stored, placed on the load port to the stocker device side position,
• the carrier transport mechanism transports the carrier in which the substrate before treatment is stored from the stocker device side position to the interface device side position,
• the second transport robot transports the carrier in which the substrate before treatment is stored from the interface device side position to the second carrier placement shelf,
• the batch treatment device takes out the plurality of the substrates from the carrier, in which the substrate before treatment is stored, transported to the second carrier placement shelf, and performs predetermined batch treatment on the plurality of taken-out substrates,
• the batch treatment device transports the plurality of substrates subjected to the batch treatment to the interface device,
• the second transport robot transports the carrier that has been emptied by taking out the plurality of substrates from the second carrier placement shelf to the interface device side position,
• the carrier transport mechanism transports the empty carrier from the interface device side position to the stocker device side position,
• the first transport robot transports the empty carrier from the stocker device side position to the first carrier placement shelf,
• the single-wafer treatment device performs predetermined single-wafer treatment on the plurality of substrates received from the interface device one by one, and transports the plurality of substrates subjected to the single-wafer treatment to the empty carrier transported to the first carrier placement shelf, and
• the first transport robot transports the carrier in which the plurality of substrates subjected to the single-wafer treatment are stored from the first carrier placement shelf to the load port.