Methods of analyzing uniformity, and related apparatus and systems, for semiconductor manufacturing

A non-transitory computer readable medium applicable for semiconductor manufacturing, the non-transitory computer readable medium comprising instructions that when executed cause a plurality of operations to be conducted, the plurality of operations comprising:

• analyzing a signal profile by comparing the signal profile to a range, the range is less than 10% of a target value, and the analyzing comprising:
• identifying a signal difference in the signal profile, and
• determining if the signal difference is within or outside of the range;
• and
• if the signal difference is outside of the range, conducting one or more of:
• indicating a process non-uniformity, or
• rejecting the signal profile.

A system for processing substrates and applicable for semiconductor manufacturing, the system comprising:

• a chamber body comprising one or more sidewalls;
• a window, the one or more sidewalls and the window at least partially defining an internal volume;
• one or more heat sources configured to heat the internal volume;
• a substrate support disposed in the internal volume;
• a sensor configured to sense parameters in the internal volume;
• and
• a controller comprising instructions that, when executed, cause a plurality of operations to be conducted, the plurality of operations comprising:
• generating a signal profile, the signal profile comprising a plurality of readings,
• analyzing the signal profile by comparing the signal profile to a range, the range is less than 10% of a target value, and the analyzing comprising:
• identifying a signal difference in the signal profile, and
• determining if the signal difference is within or outside of the range, and
• if the signal difference is outside of the range, conducting one or more of:
• indicating a process non-uniformity, or
• rejecting the signal profile.