Optimized cell layout

Abstract

The present disclosure describes an example layout and method for cell placement in an integrated circuit (IC) layout design. The layout includes a first semiconductor structure having a first channel with a first channel width and a second semiconductor structure having a second channel with a second channel width different from the first channel width. The first and second channels can be in contact with each other. The method includes disposing a first diffusion region in a layout area and disposing a second diffusion region in the layout area. The first diffusion region can have a first diffusion region width and the second diffusion region can have a second diffusion region width different from the first diffusion region width.

Dependencies are inferred from the claim text.