Measurement of inherent substrate distortion
AssigneeApplied Materials, Inc.
InventorsPiyush Kumar Pandey, Prabal Sen, Ganapathy Saravanavel, Himadri Shekhar Hansda, Mohammed Dilkash Azam, Sidharth Bhatia
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Abstract
A method includes obtaining first data indicative of a measured profile of a substrate. The method further includes obtaining second data indicative of a profile of a reference substrate. The method further includes determining a corrected substrate profile based on the first data and the second data. The method further includes performing a corrective action based on the corrected substrate profile.
Claims20
A method, comprising:
- obtaining first data indicative of a measured profile of a substrate;
- obtaining second data indicative of a profile of a reference substrate;
- determining a corrected substrate profile based on the first data and the second data;
- and
- performing a corrective action based on the corrected substrate profile.
A non-transitory machine-readable storage medium storing instructions which, when executed, cause a processing device to perform operations comprising:
- obtaining first data indicative of a measured profile of a substrate;
- obtaining second data indicative of a profile of a reference substrate;
- determining a corrected substrate profile based on the first data and the second data;
- and
- performing a corrective action based on the corrected substrate profile.
A system, comprising memory and a processing device coupled to the memory, wherein the processing device is configured to:
- obtain first data indicative of a measured profile of a substrate;
- obtain second data indicative of a profile of a reference substrate;
- determine a corrected substrate profile based on the first data and the second data;
- and
- perform a corrective action based on the corrected substrate profile.
Dependencies are inferred from the claim text.