Charged-particle beam apparatus for voltage-contrast inspection and methods thereof
AssigneeASML Netherlands B.V.
InventorsDatong ZHANG, Xiaoyu JI, Weiming REN, Xuedong LIU, Chia Wen LIN
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AssigneeASML Netherlands B.V.
InventorsDatong ZHANG, Xiaoyu JI, Weiming REN, Xuedong LIU, Chia Wen LIN
Estimating the term…
Systems and methods of inspecting a sample using a charged-particle beam apparatus with enhanced probe current and high current density of the primary charged-particle beam are disclosed. The apparatus includes a charged-particle source, a first condenser lens configured to condense the primary charged-particle beam and operable in a first mode and a second mode, wherein: in the first mode, the first condenser lens is configured to condense the primary charged-particle beam, and in the second mode, the first condenser lens is configured to condense the primary charged-particle beam sufficiently to form a crossover along the primary optical axis. The apparatus further includes a second condenser lens configured to adjust a first beam current of the primary charged-particle beam in the first mode and adjust a second beam current of the primary charged-particle beam in the second mode, the second beam current being larger than the first beam current.
A charged-particle beam apparatus comprising:
A non-transitory computer readable medium storing a set of instructions that is executable by one or more processors of a charged-particle beam apparatus to cause the charged particle beam apparatus to perform a method comprising:
A charged-particle beam apparatus comprising:
Dependencies are inferred from the claim text.