Substrate supporting device and substrate processing apparatus

Abstract

Provided is a substrate supporting device, including a susceptor and a rotating tube. The susceptor is arranged in the process chamber of a substrate processing apparatus for supporting the substrate; the bottom surface of the susceptor is provided with a first limiting portion; the rotating tube, having a cylindrical structure, is arranged below the susceptor and supports the susceptor, the side wall of the rotating tube is provided with a second limiting portion corresponding to the first limiting portion in position, and relative movement between the rotating tube and the susceptor in the horizontal direction is limited when the two rotate through cooperation of the first limiting portion and the corresponding second limiting portion. The present invention also provides a substrate processing apparatus. According to the present invention, synchronous rotation of the susceptor and the rotating tube can be ensured, thereby enabling the susceptor to be uniformly heated, and ensuring uniformity of substrate surface temperature.

Dependencies are inferred from the claim text.