Deposition of noble metal islets or thin films for its use for electrochemical catalysts with improved catalytic activity

A chemical having one of the following formulae in which M represents a Platinum group element:

• a) M(L1)(L2)x1 wherein:
• i) L1 is a η5- ligand excluding cyclopentadienyl,
• ii) each L2 is independently selected from an H, an alkyl group, an allyl group, NO, a halide, an alkoxide, an amide, an alkoxycarbyl, an aminocarbyl, a beta-diketonate, a beta-diketoiminate, a ketoiminate, a formamidinate, an amidinate, a guanidinate, or a carbonyl, and
• iii) x1 represents the number of L2 ligands;
• b) M(L3)(L4)x2 wherein:
• i) L3 is a cyclopentadienyl ligand,
• ii) each L4 is independently selected from an H, a C2-C6 alkyl group, NO, a halide, an alkoxide, an amide, an alkoxycarbyl, an aminocarbyl, a beta-diketonate, a beta-diketoimide, a formamidinate, an amidinate, or a guanidinate, and
• iii) x2 represents the number of L4 ligands;
• c) M(L5)(L6)x3 wherein:
• i) L5 is a η3- ligand,
• ii) each L6 is independently selected from an H, a C2-C6 alkyl group, NO, a halide, an alkoxide, an amide, an alkoxycarbyl, an aminocarbyl, pentadienyl, a cyclohexadienyl, a cycloheptadienyl, pyrrolyl, a heterocyclic ligand, a beta-diketonate, a beta-diketoimide, a formamidinate, an amidinate, or a guanidinate, and
• iii) x3 represents the number of L6 ligands.