Method of forming alloy thin film using atomic layer deposition process including optimal unit process, and electronic element manufactured using the same

Abstract

A method of forming an alloy thin film including a low work function metal through a super-cycle ALD process, the method including performing a first unit process of forming an oxide or nitride of a low-work function metal, and performing a second unit process of forming a film of a different type metal on the oxide or nitride, wherein the second unit process includes (a) injecting a precursor of a source of the different type metal for a first time, (b) injecting a purge gas, (c) injecting a reactant, and (d) injecting a purge gas, and the second unit process further includes, prior to the injecting of the precursor of the source of the different type metal, injecting the precursor of the source of the different type metal for a second time to reduce the low work function metal.

Dependencies are inferred from the claim text.