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US 2025/0027152 A1Published application
Selective surface patterning via nanoimprinting
AssigneeIllumina, Inc.
InventorsAndrew A. Brown, Wayne N. George, Alexandre Richez, M. Shane Bowen
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Abstract
Substrates comprising dual functional polymer layered surfaces and the preparation thereof by using UV nano-imprinting processes are disclosed. The substrates can be used as flow cells, nanofluidic or microfluidic devices for biological molecules analysis.
Claims55
A substrate, comprising:
- a surface;
- a first polymer layer disposed on the surface to form a first region, wherein the first polymer layer comprises a first plurality of functional groups;
- a second polymer layer disposed over at least a portion of the first polymer layer to form a second region, wherein the first polymer layer comprises an imprinted pattern of features;
- and
- wherein the first plurality of functional groups provide reactive sites for covalent bonding of a functionalized molecule.
2 more elements
A method for preparing a substrate, comprising:
- providing a substrate comprising a first region and a second region;
- applying a layer of a first photocurable polymer composition to the first region and the second region;
- applying a layer of a second photocurable polymer composition on top of the layer of the first photocurable polymer composition to completely cover the layer of the first photocurable polymer composition;
- contacting the layer of the second photocurable polymer composition with a template having a plurality of micro-scale or nano-scale patterns;
- applying pressure to the template or the substrate to transfer said micro-scale or nano-scale patterns to the layer of the first and the second photocurable polymer compositions;
- irradiating UV light to cure the layers of the first and the second photocurable polymer compositions such that the layers of the first and the second photocurable polymer compositions form a first polymer layer and a second polymer layer respectively;
- and
- separating the template from substrate, wherein at least a portion of the second polymer layer is perforated to expose the underlying first polymer layer.
5 more elements
A method of preparing a substrate, comprising:
- providing a substrate comprising a first patterned polymer layer on a surface of the substrate;
- depositing a first photonic crystal material on the first patterned polymer layer such that the first photonic crystal material adopts the patterns in the first patterned polymer layer;
- and
- forming a second patterned polymer layer on top of the photonic crystal material.
1 more element
Dependencies are inferred from the claim text.