Substrate processing apparatus including showerhead assembly
AssigneeSemes Co., Ltd.
InventorsSung Yeon KIM, Ho Ik KIM, In Gyu CHO
Life of this patent
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Abstract
Proposed is a substrate processing apparatus including a showerhead assembly. A showerhead assembly according to an embodiment includes an upper plate, a gas distribution plate disposed under the upper plate and having a plurality of through-holes, a shower plate disposed under the gas distribution plate and having a plurality of gas spray holes connected to the through-holes, and a fastening unit fastening the gas distribution plate and the shower plate to each other. The fastening unit includes a cam received in the shower plate, and a pinion received in the gas distribution plate. The pinion is coupled to the cam by a rack inserted through a passage formed in the gas distribution plate.
Claims20
A showerhead assembly, comprising:
- an upper plate;
- a gas distribution plate disposed under the upper plate and having a plurality of through-holes;
- a shower plate disposed under the gas distribution plate and having a plurality of gas spray holes connected to the through-holes;
- and
- a fastening unit fastening the gas distribution plate and the shower plate to each other,
- wherein the fastening unit comprises:
- a cam accommodated by the shower plate;
- and
- a pinion accommodated by the gas distribution plate,
- wherein the pinion is coupled to the cam by a rack inserted through a passage formed in the gas distribution plate.
A substrate processing apparatus, comprising:
- a chamber having a processing space therein;
- a substrate support unit disposed in the processing space and supporting a substrate;
- a gas supply unit supplying gas required for a process to the processing space;
- and
- a showerhead assembly spraying the supplied gas into the processing space,
- wherein the showerhead assembly comprises:
- an upper plate;
- a gas distribution plate disposed under the upper plate and having a plurality of through-holes;
- a shower plate disposed under the gas distribution plate and having a plurality of gas spray holes connected to the through-holes;
- and
- a fastening unit fastening the gas distribution plate and the shower plate to each other,
- wherein the fastening unit comprises:
- a cam accommodated by the shower plate;
- and
- a pinion accommodated by the gas distribution plate,
- wherein the pinion is coupled to the cam by a rack inserted through a passage formed in the gas distribution plate.
A substrate processing apparatus, comprising:
- a chamber having a processing space therein;
- a substrate support unit disposed in the processing space and supporting a substrate;
- a gas supply unit supplying gas required for a process to the processing space;
- and
- a showerhead assembly spraying the supplied gas into the processing space,
- wherein the showerhead assembly comprises:
- an upper plate;
- a gas distribution plate disposed under the upper plate and having a plurality of through-holes;
- a shower plate disposed under the gas distribution plate and having a plurality of gas spray holes connected to the through-holes;
- and
- a fastening unit fastening the gas distribution plate and the shower plate to each other,
- wherein the fastening unit comprises:
- a cam accommodated by the shower plate;
- and
- a pinion accommodated by the gas distribution plate,
- wherein the pinion is coupled to the cam by a rack inserted through a passage formed in the gas distribution plate, and
- the cam and the pinion comprise a plurality of cams and a plurality of pinions provided radially around centers of the shower plate and the gas distribution plate, respectively.
Dependencies are inferred from the claim text.