Material for removing impurities in organic solvent and method for removing impurities in organic solvent
AssigneeKurita Water Industries Ltd.
InventorsTakahiro KAWAKATSU, Yu FUJIMURA, Takaaki CHUUMAN
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AssigneeKurita Water Industries Ltd.
InventorsTakahiro KAWAKATSU, Yu FUJIMURA, Takaaki CHUUMAN
Estimating the term…
Provided is a material for removing impurities in an organic solvent having a water content of 1,000 ppm or less, the material comprising a porous ion exchange resin. It is preferred that the porous ion exchange resin has, as an ion exchange group, at least one functional group selected from the group consisting of a primary amino group, a secondary amino group, a tertiary amino group and a quaternary ammonium group. Also provided is a method for removing impurities in an organic solvent, the method comprising bringing the material for removing impurities in an organic solvent into contact with an organic solvent having a water content of 1,000 ppm or less.
A material for removing impurities in an organic solvent having a water content of 1,000 ppm or less, the material comprising:
Dependencies are inferred from the claim text.