Semiconductor manufacturing apparatus, information processing apparatus, and radio-frequency vibration data analysis method

An information processing apparatus comprising:

• a collection circuitry configured to collect radio-frequency vibration data from a sensor of a semiconductor manufacturing apparatus;
• a fast Fourier transform (FFT) circuitry configured to perform a FFT processing on the radio-frequency vibration data according to a resolution setting;
• a FFT data transmission circuitry configured to transmit FFT data generated by the FFT processing, to a controller, and
• a radio-frequency vibration data transmission circuitry configured to transmit the radio-frequency vibration data in a time period in which the FFT data exceeds a threshold value for an abnormality prediction, to the controller that analyzes the radio-frequency vibration data.

A method of analyzing radio-frequency vibration data of a semiconductor manufacturing apparatus including a first controller and a second controller, the method comprising:

• collecting, by the first controller, the radio-frequency vibration data from a sensor of the semiconductor manufacturing apparatus,
• performing, by the first controller, a fast Fourier transform (FFT) processing on the radio-frequency vibration data according to a resolution setting,
• transmitting, by the first controller, FFT data generated by the FFT processing, to the second controller, and
• transmitting, by the first controller, the radio-frequency vibration data in a time period in which the FFT data exceeds a threshold value for an abnormality prediction, to the second controller, and
• analyzing, by the second controller, the FFT data and the radio-frequency vibration data in the time period in which the FFT data exceeds the threshold value for the abnormality prediction.