Scanning electron microscopic direct-write lithography system based on a compliant nano servo motion system

A scanning electron microscopic direct-write lithography system based on a compliant nano servo motion system, comprising an electron chamber, an ion chamber, a specimen chamber and a control system, wherein:

• the electron chamber, being fixedly connected to the specimen chamber, comprises an electron chamber housing, an electron gun, an anode, an electron beam blanker, an electromagnetic lens and an electron beam deflection coil;
• the ion chamber, being fixedly connected to the specimen chamber, comprises an ion chamber housing, an ion source, a suppression electrode, an extraction electrode, a primary lens, an ion beam shutter editor, an ion beam shutter-shielding iris, a secondary lens and an ion beam-scanning deflection electrode;
• the specimen chamber comprises a specimen chamber housing, a secondary electron detector, a nanoscale-precision compliant servo motion stage system, a specimen, a telescopic feeding mechanism, a vacuuming device and a base;
• and
• the control system comprises a computer, an electron beam scanning controller, an electron beam blanker controller, an ion beam scanning controller, an ion beam shutter controller and a compliant stage execution unit driver, and wherein the scanning electron microscopic direct-write lithography system based on a compliant nano servo motion system comprises two modes, namely, a fabrication mode and an in-situ inspection mode, and the computer controls a switching between the two modes:
• in the fabrication mode, the electron beam deflection coil energized with electric current deflects an electron beam generated by the electron gun to perform a scan, or the ion beam-scanning deflection electrode energized with electric current deflects an ion beam generated by the ion source to perform a scan, and the nanoscale-precision compliant servo motion stage system drives the specimen to perform a motion,
• wherein the electron beam deflection coil or the ion beam-scanning deflection electrode is operated as a first sub-system and the nanoscale-precision compliant servo motion stage system is operated as a second sub-system, a fabrication pattern is drawn or imported by the computer and is intelligently allocated to the first sub-system and the second sub-system by the computer to be used as a reference trajectory, and the first and second sub-systems perform synchronized motions to implement a non-stitching direct-write nanofabrication;
• and
• in the inspection mode, the electron beam deflection coil energized with electric current causes an electron beam to scan a surface of the specimen, wherein electrons reflected from the surface of the specimen are configured to be detected by the secondary electron detector and form an image on the computer in order to perform an in-situ inspection.