Device and method for aligning two components

A method for aligning two components of a projection exposure apparatus for semiconductor lithography, comprising:

• inserting at least one mandrel of a first component into a recess of a second component in a z-direction, wherein the at least one mandrel provides a radial expansion of at least a portion of the mandrel perpendicular to the z-direction in response to an axial movement or feed in the mandrel along the z-direction caused by a torque,
• preloading the radial expansion of the mandrel to a predetermined torque for pre-positioning the two components in relation to each other in an x-y plane perpendicular to the z-direction,
• positioning the two components in the z-direction until they are in contact with a contact force FA,
• bracing the mandrel with the recess with a radial expansion corresponding to a maximum torque greater than the pre-determined torque,
• positioning the two components in the z-direction until the first component rests on the second component with a maximum weight force Fmax greater than the contact force FA.