Apparatus for measuring thin film thickness and method thereof

Abstract

A thin film thickness measuring apparatus and a method that can overcome the measurement limit of the reflected ultrasonic wave signal when measuring the thickness of a thin film using retroreflection of ultrasonic waves can be provided. A thin film thickness measuring apparatus includes: an ultrasonic retroreflector that is provided under a test object formed in the shape of a thin film and retroreflects an ultrasonic wave incident through the test object; an ultrasonic wave input portion that is provided on one side of the test object and inputting an ultrasonic wave to one side of the test subject; and a measurement portion that is connected to the ultrasonic wave input portion and measures an arrival time of the ultrasonic wave reflected through the test object.

Dependencies are inferred from the claim text.