Treatment liquid, treatment method, and method for manufacturing electronic device

A treatment liquid for a semiconductor substrate, the treatment liquid comprising:

• water;
• a fluoride source;
• periodic acid or a salt thereof;
• and
• a surfactant,
• wherein the treatment liquid satisfies at least one of the following requirement A, requirement B, or requirement C,
• requirement A:
• the surfactant includes a cationic surfactant, and the cationic surfactant has a monovalent aliphatic hydrocarbon group having 6 or more carbon atoms or a divalent aliphatic hydrocarbon group having 6 or more carbon atoms, and has a molecular weight of 300 or less,
• requirement B:
• the surfactant includes an anionic surfactant, and the anionic surfactant has one or more groups selected from the group consisting of a phosphoric acid group, a carboxy group, a sulfo group, and salts thereof, and has a mass ratio of a content of the anionic surfactant to a content of the fluoride source of 0.01 to 0.5, and
• requirement C:
• the surfactant includes a nonionic surfactant, and the nonionic surfactant has no fluorine atom, and is represented by Formula (C1), Formula (C2), or Formula (C3),
• RC1—(O—CH2—CH2)nC1—OH Formula (C1)
• RC2—(O—C3H6)nC2—OH Formula (C2)
• RC3—(O—C3H6)mC3—(O—CH2—CH2)nC3—OH Formula (C3)
• in Formula (C1), RC1 represents a hydrocarbon group which does not include a fluorine atom and may have a substituent, and
• nC1 represents an integer of 1 or more,
• in Formula (C2), RC2 represents a hydrocarbon group which does not include a fluorine atom and may have a substituent, and
• nC2 represents an integer of 1 or more, and
• in Formula (C3), RC3 represents a hydrocarbon group which does not include a fluorine atom and may have a substituent, and
• nC3 and mC3 each represent an integer of 1 or more.