Etching device and etching system

Abstract

An etching device for a workpiece to be processed via an etching liquid, the device comprising a cavity into which the workpiece can be introduced. The cavity is surrounded at least in some regions by at least one lock of the etching device for the workpiece. The lock and an end face of the etching device facing the lock partially surround a gap for the introduction of the etching liquid. The end face of the etching device facing the lock is transparent at least in some regions. The invention also relates to an etching system having the etching device, wherein the etching device is connected to at least one etching liquid source via at least one etching liquid supply line and to at least one etching liquid reservoir via at least one etching liquid discharge line.

Dependencies are inferred from the claim text.