Pedestals for modulating film properties in atomic layer deposition (ald) substrate processing chambers

A system to deposit a film on a substrate using atomic layer deposition in a processing chamber, the system comprising:

• a pedestal arranged in the processing chamber to support the substrate on a top surface of the pedestal when depositing the film on the substrate using atomic layer deposition in the processing chamber;
• a first annular recess in the pedestal that extends downwardly from the top surface of the pedestal and radially inwardly from an outer edge of the pedestal towards an outer edge of the substrate, wherein the first annular recess has an inner diameter that is greater than a diameter of the substrate;
• an annular ring that is made of a dielectric material and that is arranged around the substrate in the first annular recess;
• and
• a second annular recess in the pedestal that is located under the annular ring, wherein the second annular recess has a height and extends radially inwardly from the outer edge of the pedestal towards the outer edge of the substrate.