Patterned low melting glass (lmg) photonic film surfaces by wet-etch photolithography

A method of making a glass article, comprising

• depositing an etch mask on a primary surface of a surface layer of a glass substrate, the etch mask forming a pattern on the primary surface;
• exposing the surface layer of the glass substrate to an etchant, thereby removing a relief of the pattern forming a relief surface in the primary surface of the surface layer glass substrate, the relief surface having an inverse pattern of the etch mask;
• and
• removing the etch mask revealing an elevated surface adjacent to a plurality of troughs, wherein the elevated surface and the relief surface form a periodic morphology, wherein the plurality of troughs have a depth H relative to the elevated surface from about 0.2 μm-10 μm, a width S defined at H/2, and wherein a ratio S/H is in a range from about 1 to about 15.

A glass article, comprising:

• a film layer deposited on a glass substrate, the film layer comprising a melting point less than 450° C. comprising a thickness and a primary surface,
• wherein the primary surface defines at least one elevated surface protruding relative to at least one relief surface,
• where the elevated surface forms a periodic pattern defined by an etch mask and the relief surface is defined as an inverse pattern of the etch mask, and
• wherein the duration of an etching process applied to the film layer defines a ratio of a first area of the elevated surface to a second area of the relief surface.